Semiconductor device with redistribution layers formed utilizing dummy substrates

ABSTRACT

A semiconductor device with redistribution layers formed utilizing dummy substrates is disclosed and may include forming a first redistribution layer on a first dummy substrate, forming a second redistribution layer on a second dummy substrate, electrically connecting a semiconductor die to the first redistribution layer, electrically connecting the first redistribution layer to the second redistribution layer, and removing the dummy substrates. The first redistribution layer may be electrically connected to the second redistribution layer utilizing a conductive pillar. An encapsulant material may be formed between the first and second redistribution layers. Side portions of one of the first and second redistribution layers may be covered with encapsulant. A surface of the semiconductor die may be in contact with the second redistribution layer. The dummy substrates may be in panel form. One of the dummy substrates may be in panel form and the other in unit form.

CROSS-REFERENCE TO RELATED APPLICATIONS

The present application is a continuation of U.S. application Ser. No.16/921,522, filed Jul. 6, 2020, which is a continuation of U.S.application Ser. No. 14/449,654, filed Aug. 1, 2014 and makes referenceto, claims priority to, and claims the benefit of Korean PatentApplication No. 10-2014-0013332, filed on Feb. 5, 2014, the contents ofwhich are hereby incorporated herein by reference, in their entirety.

FIELD

Certain embodiments of the disclosure relate to semiconductor chippackaging. More specifically, certain embodiments of the disclosurerelate to a semiconductor device with redistribution layers formedutilizing dummy substrates.

BACKGROUND

In general, a semiconductor package includes a semiconductor die, aplurality of leads electrically connected to the semiconductor die andan encapsulant encapsulating the semiconductor die and the leads. Ingeneral, a POP (Package On Package) refers to a technique for verticallystacking packages incorporating at least one semiconductor die. Sincethe packages are individually tested and only tested packages may bestacked, the POP is advantageous in view of assembling yield.

However, in the conventional POP, since a relatively thick printedcircuit board (PCB) is typically used as a substrate and a solder ballhaving a relatively large diameter is used as an internal conductor, theoverall thickness of the POP is approximately 1 mm or greater. Inaddition, a circuit pattern formed on the substrate has a width ofapproximately 10 μm or greater.

The PCB includes a variety of organic materials, and the coefficient ofthe thermal expansion of the organic material may be significantlydifferent from that of an inorganic material, such as the semiconductordie or an encapsulant, and as such a considerably severe warpingphenomenon may occur to the completed POP.

Additionally, in order to fabricate a POP, the costly PCB must bepurchased, increasing the manufacturing cost of the POP.

Further limitations and disadvantages of conventional and traditionalapproaches will become apparent to one of skill in the art, throughcomparison of such systems with the present disclosure as set forth inthe remainder of the present application with reference to the drawings.

BRIEF SUMMARY

A semiconductor device with redistribution layers formed utilizing dummysubstrates, substantially as shown in and/or described in connectionwith at least one of the figures, as set forth more completely in theclaims.

Various advantages, aspects and novel features of the presentdisclosure, as well as details of an illustrated embodiment thereof,will be more fully understood from the following description anddrawings.

BRIEF DESCRIPTION OF SEVERAL VIEWS OF THE DRAWINGS

FIGS. 1A-1N are cross-sectional views illustrating a manufacturingmethod of a semiconductor device, in accordance with an exampleembodiment of the present disclosure.

FIG. 2 is a cross-sectional view of a semiconductor device withencapsulant, in accordance with an example embodiment of the disclosure.

FIG. 3 is a cross-sectional view illustrating a semiconductor devicewith encapsulant and solder ball contacts, in accordance with an exampleembodiment of the present disclosure.

FIG. 4 is a cross-sectional view illustrating a semiconductor devicewith single pillars for connecting redistribution layers, in accordancewith an example embodiment of the present disclosure.

FIG. 5 is a cross-sectional view illustrating a semiconductor devicewith a flip-chip bonded die, in accordance with an example embodiment ofthe present disclosure.

FIG. 6 is a cross-sectional view illustrating a semiconductor devicewith a semiconductor die in contact with a first redistribution layerand electrically coupled to a second redistribution layer, in accordancewith another example embodiment of the present disclosure.

FIGS. 7A-7C are diagrams illustrating a manufacturing method of asemiconductor device utilizing different sizes of dummy substrates, inaccordance with an example embodiment of the present disclosure.

FIG. 8 is a cross-sectional view illustrating stacked semiconductordevices, in accordance with an example embodiment of the presentdisclosure.

FIG. 9 is a cross-sectional view illustrating a semiconductor devicewith a formed cavity, in accordance with an example embodiment of thepresent disclosure.

FIGS. 10A-10C are diagrams illustrating a manufacturing method of asemiconductor device utilizing panels and individual units, inaccordance with an example embodiment of the present disclosure.

DETAILED DESCRIPTION

Certain aspects of the disclosure may be found in a semiconductor devicewith redistribution layers formed utilizing dummy substrates. Exampleaspects of the disclosure may comprise forming a first redistributionlayer on a first dummy substrate, forming a second redistribution layeron a second dummy substrate, electrically connecting a semiconductor dieto the first redistribution layer, electrically connecting the firstredistribution layer to the second redistribution layer, and removingthe first and second dummy substrates. The first redistribution layermay be electrically connected to the second redistribution layerutilizing a conductive pillar. An encapsulant material may be formedbetween the first redistribution layer and the second redistributionlayer. Side portions of one of the first and second redistributionlayers may be covered with encapsulant. A surface of the semiconductordie may be in contact with the second redistribution layer. The firstand second dummy substrates may be in panel form, or one of the firstand second dummy substrates may be in panel form and the other may be inunit form. A third redistribution layer may be bonded to one of thefirst and second redistribution layers after removing the first andsecond dummy substrates. An encapsulant material may be formed near sideedges of the first and second redistribution layers but not in contactwith the semiconductor die. A back surface of the first and secondredistribution layers may be exposed by removing the first and seconddummy substrates. A solder ball may be formed on an exposed back surfaceof the first and second redistribution layers. The first and seconddummy substrates may be removed utilizing grinding and/or etchingprocesses. The semiconductor die may be flip-chip bonded to the firstredistribution layer.

Various aspects of the present disclosure may be embodied in manydifferent forms and should not be construed as being limited to theexample embodiments set forth herein. Rather, these example embodimentsof the disclosure are provided so that this disclosure will be thoroughand complete and will fully convey various aspects of the disclosure tothose skilled in the art.

In the drawings, the thickness of layers and regions are exaggerated forclarity. Here, like reference numerals refer to like elementsthroughout. As used herein, the term “and/or” includes any and allcombinations of one or more of the associated listed items.

In addition, the terminology used herein is for the purpose ofdescribing particular embodiments only and is not intended to belimiting of the disclosure. As used herein, the singular forms areintended to include the plural forms as well, unless the context clearlyindicates otherwise. It will be further understood that the terms“comprises” and/or “comprising,” when used in this specification,specify the presence of stated features, numbers, steps, operations,elements, and/or components, but do not preclude the presence oraddition of one or more other features, numbers, steps, operations,elements, components, and/or groups thereof.

It will be understood that, although the terms first, second, etc. maybe used herein to describe various members, elements, regions, layersand/or sections, these members, elements, regions, layers and/orsections should not be limited by these terms. These terms are only usedto distinguish one member, element, region, layer and/or section fromanother. Thus, for example, a first member, a first element, a firstregion, a first layer and/or a first section discussed below could betermed a second member, a second element, a second region, a secondlayer and/or a second section without departing from the teachings ofthe present disclosure.

As illustrated in FIG. 1A, a first dummy substrate 110A having asubstantially planar top surface and a substantially planar bottomsurface is prepared. The first dummy substrate 110A may include, forexample, silicon, low-grade silicon, glass, silicon carbide, sapphire,quartz, ceramic, metal oxide, a metal, or equivalents thereof, butaspects of the present disclosure are not limited thereto.

A method for forming the first redistribution layer 110 on the firstdummy substrate 110A will now be described. The method of forming thefirst redistribution layer 110 is substantially the same as a method offorming the second redistribution layer 120 on the second dummysubstrate 120A.

As illustrated in FIG. 1B, first, a first dielectric layer 111 may bedeposited on the first dummy substrate 110A by chemical vapor deposition(CVD), and first openings 111 a may be formed by a photolithographyprocess and/or a laser process. A top surface of the first dummysubstrate 110A may be directly exposed to the outside by the firstopenings 111 a.

Here, the first dielectric layer 111 may include silicon oxide, siliconnitride and/or equivalents thereof, but aspects of the presentdisclosure are not limited thereto.

As illustrated in FIG. 1C, first redistributions 112 may be formed inthe first openings 111 a and the first dielectric layer 111.Accordingly, the first redistributions 112 may make direct contact withthe first dummy substrate 110A through the first openings 111 a. Thefirst redistributions 112 may be formed by an electroless platingprocess for a seed layer based on gold, silver, nickel, titanium and/ortungsten, an electroplating process using copper, or a photolithographyprocess using photoresist, but aspects of the present disclosure are notlimited thereto.

In addition, the first redistributions 112 may include, for example, notonly copper but also a copper alloy, aluminum, an aluminum alloy, iron,an iron alloy or equivalents thereof, but aspects of the presentdisclosure are not limited thereto.

As illustrated in FIG. 1D, the process of forming the first dielectriclayer 111 and the process of forming the first redistributions 112 maybe repeated multiple times, thereby completing the first redistributionlayer 110 having a multi-layered structure. For example, the firstredistribution layer 110 includes a dielectric layer andredistributions. However, unlike in a conventional printed circuit board(PCB) (e.g., a rigid PCB or a flexible PCB), an organic core layer or anorganic build-up layer might not be utilized in the first redistributionlayer 110. Therefore, the first redistribution layer 110 may berelatively thin. For example, the first redistribution layer 110 may beformed to a thickness of 10 μm or less. By contrast, a conventional PCBmay generally be formed to a thickness in the range of 200 μm to 300 μm.

As described above, since the first redistribution layer 110 may beformed by a fabrication (FAB) process, the first redistributions 112 maybe formed with a width, thickness and/or pitch in a range of 20 nm to1000 nm. Therefore, the present disclosure may provide considerably finefirst redistributions 112, thereby accommodating highly integratedsemiconductor dies. By contrast, redistributions of conventional PCBshave been generally formed with a width, thickness and/or pitch in arange of 20 μm to 30 μm.

Here, openings 111b may be formed on the first dielectric layer 111 onthe topmost portion of the first redistribution layer 110, and someregions of the first redistributions 112 may be directly exposed to theoutside. A first conductive pad 113 and a conductive pillar 114 to laterbe described may be formed on the directly exposed first redistributions112.

As illustrated in FIG. 1E, the first conductive pad 113 may be formed inthe first redistribution 112 to allow a semiconductor die 130 to laterbe described to be electrically connected thereto. In addition, a firstconductive pillar 114 may be formed in the second redistribution layer120 to be electrically connected thereto. Here, the first conductive pad113 and the first conductive pillar 114 may include, for example,copper, a copper alloy, aluminum, an aluminum alloy, iron, an iron alloyor equivalents thereof, but aspects of the present disclosure are notlimited thereto.

In addition, since the first conductive pad 113 and the first conductivepillar 114 may also be formed by a general plating process orphotolithography process, they may be formed with a width ofapproximately 50 μm. Therefore, the first conductive pad 113 and thefirst conductive pillar 114 may be formed to be considerably fine,compared to the conventional art. For example, the conventional solderball formed on the first redistribution layer may be formed to have adiameter of approximately 200 μm or greater.

Meanwhile, a first solder cap 113 a may be additionally formed at a topend of the first conductive pad 113 to allow the semiconductor die 130to be easily connected. In addition, another solder cap 114 a may beadditionally formed at a top end of the first conductive pillar 114 toallow the second redistribution layer 120 to be easily connected.

In addition, since the first conductive pillar 114 may be electricallyconnected to the second redistribution layer 120 that is relatively farfrom the first conductive pillar 114, it may be formed to a heightgreater than that of the first conductive pad 113.

As illustrated in FIGS. 1F and 1G, the semiconductor die 130 may beelectrically connected to the first redistribution layer 110. Forexample, a bonding pad, a copper pillar or a bump 131 of thesemiconductor die 130 may be electrically connected to the firstredistribution layer 110. In addition, the semiconductor die 130 may beconnected to the first redistribution layer 110 in a flip-chip type.

The connection of the semiconductor die 130 may be achieved by, forexample, one of a general thermal compression process, a mass reflowprocess or equivalents thereof, but aspects of the present disclosureare not limited thereto. Here, the semiconductor die 130 may have athickness in a range of approximately 50 μm to approximately 70 μm, butaspects of the present disclosure are not limited thereto.

Here, a height of the first conductive pillar 114 may be greater orsmaller than that of the semiconductor die 130.

As illustrated in FIG. 1H, an underfill 140 may be injected into a spacebetween the semiconductor die 130 and the first redistribution layer110, followed by curing.

The semiconductor die 130 may be more stably fixed on the firstredistribution layer 110 by the underfill 140. Even if there is adifference in the coefficient of thermal expansion between thesemiconductor die 130 and the first redistribution layer, thesemiconductor die 130 and the first redistribution layer 110 are notelectrically disconnected from each other.

In some cases, if a dimension of an encapsulant 150 (described below) issmaller than a gap between the semiconductor die 130 and the firstredistribution layer 110, the encapsulant 150 may directly fill the gapbetween the semiconductor die 130 and the first redistribution layer110. Accordingly, the underfill 140 might not be provided.

As illustrated in FIGS. 1I and 1J, the second redistribution layer 120may be formed on the second dummy substrate 120A and the secondredistribution layer 120 may be electrically connected to the firstredistribution layer 110.

Here, the method for forming the second redistribution layer 120 may bethe same as the method for forming the first redistribution layer 110.In an example embodiment, the method for forming the secondredistribution layer 120 includes forming a second dielectric layer 121having second openings on the second dummy substrate 120A, forming aplurality of second redistributions 122 on the second dielectric layer121, and forming a second conductive pillar 124 to electrically connectthe first redistribution layer 110 to the second redistributions 122.Here, a second solder cap 124 a may be formed at a bottom end of thesecond conductive pillar 124. In addition, if the semiconductor die iselectrically connected to the second redistribution layer 120, a secondconductive pad (not shown) may also be formed.

Electrical connection of the first redistribution layer 110 and thesecond redistribution layer 120, that is, electrical connection of thefirst conductive pillar 114 and the second conductive pillar 124 may beachieved by, for example, one of a general thermal compression process,a mass reflow process or equivalents thereof, but aspects of the presentdisclosure are not limited thereto.

As illustrated in FIG. 1K, the encapsulant 150 may be injected betweenthe first redistribution layer 110 and the second redistribution layer120, followed by curing, thereby encapsulating the semiconductor die 130and the first and second conductive pillars 114 and 124. Therefore, thesemiconductor die 130 and the first and second conductive pillars 114and 124 may be safely protected from external surroundings. Theencapsulant 150 may make close contact with the first redistributionlayer 110 and the second redistribution layer 120 and may be injectedinto a space between the semiconductor die 130 and the secondredistribution layer 120. Here, a top surface of the semiconductor die130 may be spaced a predetermined distance apart from a bottom surfaceof the second redistribution layer 120.

After the first redistribution layer 110 and the second redistributionlayer 120 are electrically connected, the encapsulation may be achievedby a transfer molding process, a compression molding process, aninjection molding process and equivalents thereof, but aspects of thepresent disclosure are not limited thereto.

In addition, the encapsulant 150 may generally include, for example,epoxy, a film, a paste and equivalents thereof, but aspects of thepresent disclosure are not limited thereto.

Further, the encapsulant 150 may be in the form of a film or a paste tothen be attached, coated or applied to the first redistribution layer110 and the second redistribution layer 120, followed by electricallyconnecting the first redistribution layer 110 and the secondredistribution layer 120. During this process, the encapsulant 150 ofthe first redistribution layer 110 and the encapsulant 150 of the secondredistribution layer 120 may be bonded to each other to make oneencapsulant 150.

In such a manner, the first and second redistribution layers 110 and120, the semiconductor die 130 and the first and second conductivepillars 114 and 124 might not be separated from each other but may bemechanically integrated by the encapsulant 150.

In addition, a flexible epoxy resin may be used as the encapsulant 150,for example. The flexible epoxy resin may retain flexibility even aftercuring, thereby achieving a flexible semiconductor device. For example,even if the flexible semiconductor device is bent with a predeterminedcurvature, it might not be damaged by the encapsulant 150, that is, theflexible epoxy resin, and might not experience functional deterioration.

The flexible semiconductor device may be applied to wearable devices ofa variety of types, for example, a glass mounting type, a bracelet type,an arm band type, a pendent type, a wrist mounting type, or the like.

As illustrated in FIG. 1L, the first dummy substrate 110A may be removedfrom the first redistribution layer 110. In detail, the first dummysubstrate 110A may be removed by grinding using the second dummysubstrate 120A as a wafer support system, followed by performing a dryetching process and/or a wet etching process, thereby completelyremoving the first dummy substrate 110A.

In such a manner, some regions of the first redistributions 112 of thefirst redistribution layer 110 may be exposed to the outside (e.g., alower portion) through the first dielectric layer 111. In more detail, aseed layer (gold, silver, nickel, titanium, and/or tungsten) may bedirectly exposed to the outside through the first dielectric layer 111.Gold and/or silver may be directly exposed to the outside through thefirst dielectric layer 111 to facilitate a connection with a solder ballor another semiconductor device in a subsequent process.

As illustrated in FIG. 1M, a solder ball 160 may be connected to thefirst redistribution 112 exposed to the outside through the firstdielectric layer 111. For example, a volatile flux may be coated on apredetermined region of the first redistribution 112 exposed to theoutside through the first dielectric layer 111, and the solder ball 160may be positioned on the flux, following by the supply of a temperatureof approximately 150° C. to approximately 250° C. to make the fluxvolatilize to connect the solder ball 160 to be connected to a region ofthe first redistribution 112. Thereafter, the solder ball 160 may becompletely mechanically/electrically connected to the firstredistribution 112 through a cooling process.

As illustrated in FIG. 1N, the second dummy substrate 120A may beremoved from the second redistribution layer 120. In detail, the seconddummy substrate 120A may be removed by a predetermined thickness bygrinding using a separate wafer support system, followed by performing adry etching process and/or a wet etching process, thereby completelyremoving the second dummy substrate 120A.

In such a manner, some regions of the second redistributions 122 and thesecond redistribution layer 120 may be exposed to the outside (e.g., anupper portion) through the second dielectric layer 121.

Here, a seed layer (gold, silver, nickel, titanium, and/or tungsten) maybe directly exposed to the outside through the second dielectric layer121. Gold and/or silver may be directly exposed to the outside throughthe second dielectric layer 121 to facilitate a connection with a solderball or another semiconductor device in a subsequent process.

Meanwhile, in a case where the first dummy substrate 110A and the seconddummy substrate 120A are provided in forms of panels, after the removingof the first and second dummy substrates 110A and 120A, a sawing processmay be performed. In the sawing process, the first and secondredistribution layers 110 and 120 and the encapsulant 150 may bevertically sawn using a sawing tool. As a result of the sawing, sidesurfaces of the first and second redistribution layers 110 and 120 andthe encapsulant 150 may be coplanar. In this case, the horizontallengths of the first and second redistribution layers 110 and 120 may beequal to each other.

In such a manner, a so-called double-sided electrode package havingelectrode terminals formed on top and bottoms surfaces is completed.Therefore, another semiconductor device, package or component may bemounted on the completed semiconductor device 100.

Meanwhile, as described above, according to various aspects of thepresent disclosure, since a PCB is not used, unlike in the conventionalart, the semiconductor device 100 that is slim and having goodelectrical properties and a suppressed warp phenomenon may be provided.For example, the semiconductor device 100 having a thickness ofapproximately 100 μm to approximately 200 μm by using a redistributionlayer having a thickness of approximately 10 μm or less is provided. Inaddition, the semiconductor device 100 having good electrical properties(with a reduced loss in the power) is provided by using redistributionshaving a width, thickness and/or pitch in a range of 20 nm to 30 nm.Further, since a dielectric layer included in the redistribution layermay be made of an inorganic material, the semiconductor device 100having a coefficient of thermal expansion similar to that of thesemiconductor die 130 or the encapsulant 150 while suppressing a warpphenomenon, may be provided.

Further, according to various aspects of the present disclosure, sincethe redistribution layer may be formed using existing depositionequipment, plating equipment or photolithography equipment withoutpurchasing a conventional expensive PCB, the semiconductor device 100may be manufactured at a low cost.

FIG. 2 is a cross-sectional view of a semiconductor device withencapsulant, in accordance with an example embodiment of the disclosure.

As illustrated in FIG. 2 , in the semiconductor device 200 according toanother embodiment of the present disclosure, a horizontal length of thesecond redistribution layer 120 is smaller than that of the firstredistribution layer 110, and side portions of the second redistributionlayer 120 may be surrounded by the encapsulant 150. Here, a top surfaceof the second redistribution layer 120 and a top surface of theencapsulant 150 may be coplanar.

With this configuration, a binding force between the secondredistribution layer 120 and the encapsulant 150 may be furtherincreased. The configuration of the semiconductor device 200 may resultfrom a corresponding difference in the manufacturing methods describedherein.

FIG. 3 is a cross-sectional view illustrating a semiconductor devicewith encapsulant and solder ball contacts, in accordance with an exampleembodiment of the present disclosure.

As illustrated in FIG. 3 , in the semiconductor device 300 according toanother embodiment of the present disclosure, a length of a firstredistribution layer 110 may be smaller than that of a secondredistribution layer 120, and side portions of the first redistributionlayer 110 may be surrounded by an encapsulant 150. Here, a bottomsurface of the second redistribution layer 110 and a bottom surface ofthe encapsulant 150 may be coplanar.

With this configuration, a binding force between the firstredistribution layer 110 and the encapsulant 150 may be furtherincreased. The configuration of the semiconductor device 300 may resultfrom a difference in the manufacturing methods described herein.

FIG. 4 is a cross-sectional view illustrating a semiconductor devicewith single pillars for connecting redistribution layers, in accordancewith an example embodiment of the present disclosure.

As illustrated in FIG. 4 , in the semiconductor device 400 according toanother embodiment of the present disclosure, a semiconductor die 130may be brought into direct contact with the second redistribution layer120. For example, since a top surface of the semiconductor die 130 maymake direct contact with a bottom surface of the second redistributionlayer 120, there might be no encapsulant existing between the topsurface of the semiconductor die 130 and the bottom surface of thesecond redistribution layer 120.

Accordingly, a distance between the first redistribution layer 110 andthe second redistribution layer 120 may be reduced. Thus, a conductivepillar 114 might be formed only on the first redistribution layer 110 orthe second redistribution layer 120. For example, the firstredistribution layer 110 and the second redistribution layer 120 may beelectrically connected to each other through the single conductivepillar 114. A solder cap 114 a may be formed at an end of the conductivepillar 114.

As described above, there might be no encapsulant existing in a space orgap between the semiconductor die 130 and the second redistributionlayer 120, thereby enabling the semiconductor device 400 to have afurther reduced thickness.

FIG. 5 is a cross-sectional view illustrating a semiconductor devicewith a flip-chip bonded die, in accordance with an example embodiment ofthe present disclosure.

As illustrated in FIG. 5 , in the semiconductor device 500 according toanother embodiment of the present disclosure, a semiconductor die 130may be electrically connected to a second redistribution layer 120,instead of a first redistribution layer 110. For example, thesemiconductor die 130 may be electrically connected to the secondredistribution layer 120 in a flip-chip type configuration. Here, anunderfill 140 may be injected into a space between the semiconductor die130 and the second redistribution layer 120, thereby further increasinga mechanical binding force between the semiconductor die 130 and thesecond redistribution layer 120. In addition, a conductive pad 123 to beconnected to a bump 131 of the semiconductor die 130 may be formed inthe second redistribution layer 120, and a solder cap 123 a may beformed between the conductive pad 123 and the bump 131.

FIG. 6 is a cross-sectional view illustrating a semiconductor devicewith a semiconductor die in contact with a first redistribution layerand electrically coupled to a second redistribution layer, in accordancewith an another example embodiment of the present disclosure.

As illustrated in FIG. 6 , in the semiconductor device 600 according toanother embodiment of the present disclosure, a semiconductor die 130may be brought into direct contact with the first redistribution layer110. For example, since a bottom surface of the semiconductor die 130makes direct contact with a top surface of the first redistributionlayer 110 in this example, there might be no encapsulant existingbetween the bottom surface of the semiconductor die 130 and the topsurface of the first redistribution layer 110.

In addition, a distance between the first redistribution layer 110 andthe second redistribution layer 120 may be reduced. Thus, a conductivepillar 124 might be formed only on the first redistribution layer 110 orthe second redistribution layer 120. For example, the firstredistribution layer 110 and the second redistribution layer 120 may beelectrically connected to each other through the single conductivepillar 124. A solder cap 124 a may be formed at an end of the conductivepillar 124.

As described above, there might be no encapsulant existing in a space orgap between the semiconductor die 130 and the first redistribution layer110, thereby enabling the semiconductor device 600 to have a furtherreduced thickness.

FIGS. 7 a-7 c are diagrams illustrating a manufacturing method of asemiconductor device utilizing different sizes of dummy substrates, inaccordance with an example an embodiment of the present disclosure.

As illustrated in FIG. 7A, first and second dummy substrates 110A and110B may be provided in forms of panels. For example, the lengths of thefirst and second dummy substrates 110A and 110B may be equal to eachother, and a plurality of semiconductor devices 100 may be manufacturedbetween the first and second dummy substrates 110A and 110B. Thesemiconductor device 100 shown in FIG. 1N may be manufactured by thepanel-shaped first and second dummy substrates 110A and 110B, followedby sawing, thereby making the first and second redistribution layers 110and 120 and side surfaces of the encapsulant 150 coplanar.

Here, the panel has a substantially rectangular shape and may beprovided in a strip from which a plurality of semiconductor devices maybe manufactured.

As illustrated in FIG. 7B, a first dummy substrate 110A may be providedin the form of a panel and second dummy substrates 120A may also beprovided. For example, the second dummy substrates 120A in forms ofmultiple units each having a relatively small length may be positionedon the first dummy substrate 110A in the form of a panel having arelatively large length. Therefore, the plurality of semiconductordevices 200 may be manufactured between the panel-type first dummysubstrate 110A and the unit-type second dummy substrates 120A. Thesemiconductor device 200 shown in FIG. 2 may, for example, bemanufactured by the panel-type first dummy substrate 110A and theunit-type second dummy substrates 120A, followed by sawing, therebyallowing the encapsulant 150 to cover side surfaces of the secondredistribution layer 120. Here, side surfaces of the encapsulant 150 andthe first redistribution layer 110 may be coplanar.

As illustrated in FIG. 7C, the second dummy substrates 120A may beprovided in forms of panels and the first dummy substrate 110A may beprovided in form of a unit. For example, multiple first dummy substrates110A in forms of multiple units each having a relatively small lengthmay be positioned under a panel-type second dummy substrate 120A in theform of a panel having a relatively large length. Therefore, a pluralityof semiconductor devices 300 may be formed between the panel-type seconddummy substrate 120A and the unit-type first dummy substrates 110A. Thesemiconductor devices 300 shown in FIG. 3 may, for example, bemanufactured by the panel-type second dummy substrate 120A and theunit-type first dummy substrates 110A, followed by sawing, therebyallowing the encapsulant 150 to cover side surfaces of the firstredistribution layer 110. Here, side surfaces of the encapsulant 150 andthe second redistribution layer 120 may be coplanar.

Although not shown, the first and second dummy substrates 110A and 1108may also be provided in forms of units. Semiconductor devices may bemanufactured between the unit-type first and second dummy substrates110A and 110B, followed by sawing, thereby allowing the encapsulant 150to surround side surfaces of the first and second redistribution layers110 and 120.

FIG. 8 is a cross-sectional view illustrating stacked semiconductordevices, in accordance with an example embodiment of the presentdisclosure.

As illustrated in FIG. 8 , according to the embodiment of the presentdisclosure, a plurality of semiconductor devices 100 may be prepared,and the plurality of semiconductor devices 100 may be vertically stackedto attain a single POP semiconductor device 800.

In an exemplary embodiment, an overlying second semiconductor device 100may be electrically connected to an underlying first semiconductordevice 100. In detail, a solder ball 160 of the second semiconductordevice 100 may be electrically connected to a second redistributionlayer 120 of the first semiconductor device 100.

In such a manner, according to the present disclosure, the plurality ofsemiconductor devices 100 may be easily stacked, thereby providing thePOP semiconductor device 800, which may be applied to a highlyfunctional smart phone, mobile phone or computer.

FIG. 9 is a cross-sectional view illustrating a semiconductor device(900) with a formed cavity, in accordance with an example embodiment ofthe present disclosure.

As illustrated in FIG. 9 , in the semiconductor device 900 according toanother embodiment of the present disclosure, an encapsulant 950 may beformed only between a first redistribution layer 110 and a secondredistribution layer 120, which are at exterior areas of conductivepillars 114 and 124. For example, the encapsulant 950 may be formed onlyat the exterior areas without surrounding the semiconductor die 130 andconductive pillars 114 and 124, thereby allowing the semiconductor die130 and conductive pillars 114 and 124 to be positioned in an emptyspace 960 between the first redistribution layer 110 and the secondredistribution layer 120. The space 960 may be filled with nitrogen orinert gas (Argon) to suppress the semiconductor die 130 and theconductive pillars 114 and 124 from being oxidized. Further, in somecases, the encapsulant 950 might not be provided or a throughhole (notshown) may be formed in the encapsulant 950, so that externally appliedphysical variations, such as sonic waves, pressure, etc., may betransmitted to the semiconductor die 130.

In such a manner, the semiconductor device 900 according to theembodiment of the present disclosure may accommodate the semiconductordie 130 or semiconductor packages, such as MEMS (micro-electromechanicalsystems), allowing the semiconductor device 900 to be applied in a widervariety of application fields.

FIGS. 10A-10C are diagrams illustrating a manufacturing method of asemiconductor device utilizing panels and individual units, inaccordance with an example embodiment of the present disclosure.

As illustrated in FIG. 10A, first and second dummy substrates 210A and210B may be provided in forms of substantially round wafers. Forexample, round areas of the first and second dummy substrates 210A and210B may be equal to each other, and a plurality of semiconductordevices 100 may be manufactured between the first and second dummysubstrates 210A and 210B. The semiconductor device 100 shown in FIG. 1Nmay be manufactured by the wafer-type first and second dummy substrates210A and 210B, followed by sawing, thereby making side surfaces of thefirst and second redistribution layers 110 and 120 and the encapsulant150 coplanar.

As illustrated in FIG. 10B, the first dummy substrate 210A may beprovided in the form of a wafer and the second dummy substrates 210B maybe provided in the form of units. The second dummy substrates 210B informs of multiple units each having a relatively small area may bepositioned on the first dummy substrate 210A in the form of a waferhaving a relatively large area. Therefore, the plurality ofsemiconductor devices 200 may be manufactured between the wafer-typefirst dummy substrate 210A and the unit-type second dummy substrates210B. The semiconductor device 200 shown in FIG. 2 may be manufacturedby the wafer-type first dummy substrate 210A and the unit-type seconddummy substrates 210B, followed by sawing, thereby allowing theencapsulant 150 to cover side surfaces of the second redistributionlayer 120. Here, side surfaces of the encapsulant 150 and the firstredistribution layer 110 may be coplanar.

As illustrated in FIG. 10C, the second dummy substrate 210B may beprovided in form of a wafer and the first dummy substrates 210A may beprovided in form of units. The first dummy substrates 210A in forms ofmultiple units each having a relatively small area may be positionedunder the second dummy substrate 2108 in the form of a wafer having arelatively large area. Therefore, a plurality of semiconductor devices300 may be manufactured between the wafer-type second dummy substrate210B and the unit-type first dummy substrates 210A. The semiconductordevices 300 shown in FIG. 3 may be manufactured by the wafer-type seconddummy substrate 2108 and the unit-type first dummy substrates 210A,followed by sawing, thereby allowing the encapsulant 150 to surroundside surfaces of the first redistribution layer 110. Here, side surfacesof the encapsulant 150 and the second redistribution layer 120 may becoplanar.

This disclosure provides example embodiments supporting the presentdisclosure. The scope of the present disclosure is not limited by theseexample embodiments. Numerous variations, whether explicitly providedfor by the specification or implied by the specification, such asvariations in structure, dimension, type of material and manufacturingprocess, may be implemented by one skilled in the art in view of thisdisclosure.

In an example embodiment of the disclosure a semiconductor device withplated pillars and leads is disclosed and may comprise forming a firstredistribution layer on a first dummy substrate, forming a secondredistribution layer on a second dummy substrate, electricallyconnecting a semiconductor die to the first redistribution layer,electrically connecting the first redistribution layer to the secondredistribution layer, and removing the first and second dummysubstrates. The first redistribution layer may be electrically connectedto the second redistribution layer utilizing a conductive pillar.

An encapsulant material may be formed between the first redistributionlayer and the second redistribution layer. Side portions of one of thefirst and second redistribution layers may be covered with encapsulant.A surface of the semiconductor die may be in contact with the secondredistribution layer. The first and second dummy substrates may be inpanel form or one of the first and second dummy substrates may be inpanel form and the other may be in unit form. A third redistributionlayer may be bonded to one of the first and second redistribution layersafter removing the first and second dummy substrates.

An encapsulant material may be formed near side edges of the first andsecond redistribution layers but not in contact with the semiconductordie. A back surface of the first and second redistribution layers may beexposed by removing the first and second dummy substrates. A solder ballmay be formed on an exposed back surface of the first and secondredistribution layers. The first and second dummy substrates may beremoved utilizing grinding and/or etching processes. The semiconductordie may be flip-chip bonded to the first redistribution layer.

While various aspects of the present disclosure have been described withreference to certain supporting embodiments, it will be understood bythose skilled in the art that various changes may be made andequivalents may be substituted without departing from the scope of thepresent invention. In addition, many modifications may be made to adapta particular situation or material to the teachings of the presentinvention without departing from its scope. Therefore, it is intendedthat the present invention not be limited to the particular embodimentsdisclosed, but that the present invention will include all embodimentsfalling within the scope of the appended claims.

What is claimed is:
 1. A method for manufacturing a semiconductordevice, the method comprising: forming a first redistribution layer on afirst dummy substrate; forming a second redistribution layer on a seconddummy substrate; electrically connecting a semiconductor die to thefirst redistribution layer; electrically connecting the firstredistribution layer to the second redistribution layer; and removingthe first and second dummy substrates.
 2. The method according to claim1, comprising electrically connecting the first redistribution layer tothe second redistribution layer utilizing a conductive pillar.
 3. Themethod according to claim 1, comprising forming an encapsulant materialbetween the first redistribution layer and the second redistributionlayer.
 4. The method according to claim 1, comprising covering sideportions of only one of the first and second redistribution layers withencapsulant.
 5. The method according to claim 1, wherein a surface ofthe semiconductor die is in contact with the second redistributionlayer.
 6. The method according to claim 1, wherein the first and seconddummy substrates are in panel form.
 7. The method according to claim 1,wherein one of the first and second dummy substrates is in panel formand the other is in unit form.
 8. The method according to claim 1,comprising bonding a third redistribution layer to one of the first andsecond redistribution layers after removing the first and second dummysubstrates.
 9. The method according to claim 1, comprising forming anencapsulant material near side edges of the first and secondredistribution layers but not in contact with the semiconductor die. 10.The method according to claim 1, comprising exposing a back surface ofthe first and second redistribution layers by removing the first andsecond dummy substrates.
 11. The method according to claim 1, comprisingforming a solder ball on an exposed back surface of the first and secondredistribution layers.
 12. The method according to claim 1, comprisingremoving the first and second dummy substrates utilizing grinding and/oretching processes.
 13. The method according to claim 1, comprisingflip-chip bonding the semiconductor die to the first redistributionlayer.
 14. A semiconductor device, the device comprising: a firstredistribution layer; a second redistribution layer electrically coupledto the first redistribution layer; and a semiconductor die electricallycoupled to the first redistribution layer and positioned between thefirst and second redistribution layers.
 15. The device according toclaim 14, wherein the first redistribution layer is wider than thesecond redistribution layer.
 16. The device according to claim 15,wherein encapsulant formed between the first and second redistributionlayers covers side portions of the second redistribution layer.
 17. Thedevice according to claim 14, wherein the second redistribution layer iswider than the first redistribution layer.
 18. The device according toclaim 17, wherein encapsulant formed between the first and secondredistribution layers covers side portions of the first redistributionlayer.
 19. The method according to claim 14, wherein the firstredistribution layer is electrically coupled to the secondredistribution layer utilizing a conductive pillar.
 20. A method forforming a semiconductor device, the method comprising: forming a firstredistribution layer on a first dummy substrate; forming a secondredistribution layer on a second dummy substrate; electricallyconnecting a semiconductor die to the first redistribution layer;electrically connecting the first redistribution layer to the secondredistribution layer; forming a cavity between the first and secondredistribution layers utilizing encapsulant material formed at aperimeter of and between the first and second redistribution layers,wherein the semiconductor die is within the cavity; and removing thefirst and second dummy substrates.